Antireflective surface of nanostructures fabricated by CF<sub>4</sub> plasma etching

Authors

  • W Somrang Department of physics, faculty of science, King Mongkut's University of Technology Thonburi (KMUTT). 126 Pracha Uthit Rd, Khwaeng Bang Mot, Khet Thung Khru, Krung Thep Maha Nakhon 10140
  • S Denchitcharoen Department of physics, faculty of science, King Mongkut's University of Technology Thonburi (KMUTT). 126 Pracha Uthit Rd, Khwaeng Bang Mot, Khet Thung Khru, Krung Thep Maha Nakhon 10140
  • P Eiamchai National Electronics and Computer Technology Center, 112 Thailand Science Park, Phahonyothin Rd., Klong 1,Klong Luang, Pathumthani 12120, Thailand
  • M Horprathum National Electronics and Computer Technology Center, 112 Thailand Science Park, Phahonyothin Rd., Klong 1,Klong Luang, Pathumthani 12120, Thailand
  • C Chananonnawathorn National Electronics and Computer Technology Center, 112 Thailand Science Park, Phahonyothin Rd., Klong 1,Klong Luang, Pathumthani 12120, Thailand

Abstract

In this research, the nanostructures surface were fabricated by the CF4 plasma etching process on the SiO2-based substrates for antireflection applications. The nickel films were firstly deposited on the substrates by the sputtering system. The prepared Ni layers were then annealed at 500°C for 1 minute in order to promote dewetting process to be used as metal masks. During the etching process, CF4 etching condition was performed for 15-60 min to create the SiO2 nanopillars. After the etching process, the samples were immersed in nitric acid for 5 min to remove the nickel masks. The SiO2 nanopillars without Ni were investigated for physical morphologies and optical properties by the field-emission scanning electron microscopy (FESEM) and  UV-Vis-NIR spectroscopy respectively. The results showed that the etching conditions greatly affected the sizes and shapes of the nanostructures, as well as improved the antireflection properties of the SiO2 based materials.


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Published

2017-09-21

How to Cite

[1]
W. Somrang, S. Denchitcharoen, P. Eiamchai, M. Horprathum, and C. Chananonnawathorn, “Antireflective surface of nanostructures fabricated by CF<sub>4</sub> plasma etching”, J. Met. Mater. Miner., vol. 27, no. 1, Sep. 2017.

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Original Research Articles

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