TY - JOUR AU - Leelaruedee, Kumpon AU - TAWEESUP, Kattareeya AU - VISUTTIPITUKUL, Patama PY - 2021/12/16 Y2 - 2024/03/29 TI - Formation of nano-crystalline chromium-zirconium nitride (Cr-Zr-N) film coating by DC unbalanced magnetron sputtering JF - Journal of Metals, Materials and Minerals JA - J Met Mater Miner VL - 31 IS - 4 SE - Original Research Articles DO - UR - https://jmmm.material.chula.ac.th/index.php/jmmm/article/view/1181 SP - 69-75 AB - <p>This research aimed to improve the properties of chromium nitride (CrN) film coatings by addition of zirconium (Zr) as the third element to form Cr-Zr-N ternary nitride. DC unbalanced magnetron sputtering method was used to form Cr-Zr-N film with various Zr/Zr + Cr atomic ratios.  Mechanical properties, surface morphology and crystal structure of the film were investigated. In the research, Cr-Zr-N film were categorised into 3 types with different Zr amount: low zirconium, (Zr/Zr + Cr = 0.29), medium zirconium (Zr/Zr + Cr = 0.44), and high zirconium (Zr/Zr + Cr = 0.74). All Cr-Zr-N films exhibited nano-crystalline structures with lower surface roughnesses than those of crystalline CrN film. With Zr addition, the highest hardness of Cr-Zr-N coating layer increased to 1762.7HV, in the <em>low Zr</em> film. Likewise, Young’s modulus value increased from 213.9 GPa for the Cr-N film to 269.0 GPa for the <em>low Zr</em> film. Both surface hardness and Young’s modulus slightly decreased when the amount of Zr in the ternary Cr-Zr-N film increased. The nano-crystalline Cr-Zr-N film exhibited better adhesion comparing to the binary Cr-N film. Scratch test showed the increased critical load (LC<sub>1</sub>) from 1.91 N for the CrN film to 3.21 N for the ternary Cr-Zr-N film.</p> ER -