TY - JOUR AU - Somrang, Witchaphol AU - Denchitcharoen, Somyod AU - Eiamchai, Pitak AU - Horprathum, Mati AU - Chananonnawathorn, Chanunthorn PY - 2017/09/21 Y2 - 2024/03/29 TI - Antireflective surface of nanostructures fabricated by CF4 plasma etching JF - Journal of Metals, Materials and Minerals JA - J Met Mater Miner VL - 27 IS - 1 SE - Original Research Articles DO - UR - https://jmmm.material.chula.ac.th/index.php/jmmm/article/view/332 SP - AB - <div class="WordSection1"><p>In this research, the nanostructures surface were fabricated by the CF<sub>4 </sub>plasma etching process on the SiO<sub>2</sub>-based substrates for antireflection applications. The nickel films were firstly deposited on the substrates by the sputtering system. The prepared Ni layers were then annealed at 500°C for 1 minute in order to promote dewetting process to be used as metal masks. During the etching process, CF<sub>4 </sub>etching condition was performed for 15-60 min to create the SiO<sub>2</sub> nanopillars. After the etching process, the samples were immersed in nitric acid for 5 min to remove the nickel masks. The SiO<sub>2</sub> nanopillars without Ni were investigated for physical morphologies and optical properties by the field-emission scanning electron microscopy (FESEM) and  UV-Vis-NIR spectroscopy respectively. The results showed that the etching conditions greatly affected the sizes and shapes of the nanostructures, as well as improved the antireflection properties of the SiO<sub>2</sub> based materials.</p></div><em><br clear="all" /></em> ER -