RUKKUN, J., AIEMPANAKIT, K., REAKAUKOT, P., WONGPISAN, W. ., WAREE, K., & AIEMPANAKIT, M. (2021). Investigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition parameters on structural properties and hardness of TiAlN films deposited by reactive pulsed DC magnetron sputtering. Journal of Metals, Materials and Minerals, 31(2), 118-122. Retrieved from http://jmmm.material.chula.ac.th/index.php/jmmm/article/view/1083