RUKKUN J, AIEMPANAKIT K, REAKAUKOT P, WONGPISAN W, WAREE K, AIEMPANAKIT M. Investigation of deposition parameters on the structural properties and hardness of TiAlN films deposited via reactive pulsed DC magnetron sputteringInvestigation of deposition parameters on structural properties and hardness of TiAlN films deposited by reactive pulsed DC magnetron sputtering. J Met Mater Miner [Internet]. 2021 Jun. 27 [cited 2024 Nov. 24];31(2):118-22. Available from: https://jmmm.material.chula.ac.th/index.php/jmmm/article/view/1083