Synthesized nanocomposite TiN/a-SiNx films

Authors

  • Natthapong PHINICHKA Faculty of Science, Department of General Science, Srinakharinwirot University
  • Ramesh CHANDRA Department of physics, Ch. Charan Singh University
  • Zoe H. BARBER Department of Materials Science and Metallurgy, University of Cambridge

Abstract

Nanocomposite hard coatings, nc-TiN/a-SiNx, were synthesized by an ionized magnetron sputter deposition technique (IMSD). The maximum hardness of 40.06 GPa, approximately double that of TiN, is reached at Ti0.88:Si0.12 with an rf power of 100 W and negative bias of 150 V. The hardness of the films was measured using nanoindentation. At an applied load of less than 70 mN, the indentation depth is less than 10% of the film thickness and the results show no effect of substrate on the hardness of the films. The effects of ion flux and energetic bombardment on the properties of the films were observed by varying the rf power to the built-in rf coil where an inductively coupled plasma is generated, and the dc substrate bias of which the bombardment energy is controlled. X-ray diffraction was used to investigate the structure and grain size, and its correlation with hardness behavior as a function of Si content and bias voltage. Only one phase that can be assigned to TiN was found. No signals from crystalline Si3N4 or other phases of titanium silicide were observed. The preferential growth, as a function of Si content and bias voltage, changes from (111) to a preferred (200) orientation when negative bias voltage and Si content is increased. For high hardness films, the nanocrystallite domain size of the TiN, calculated from peak broadening, was found to be less than 10 nm.

Metrics

Metrics Loading ...

References

Boulch, F., Schouler, M-C., Donnadieu, P., Chaix, J-M. and Djurado, E. 2001. Domain size distribution of Y-TZP nano-particles using XRD and HRTEM. Image Anal Stereol. 20 : 157-161.

Chiu, K-F. and Barber, Z. H. 2002. Plasma characterization of ionized physical vapor deposition system. J. Appl. Phys. 91 : 1797 – 1803.

Chiu, K-F., Blamire, M. G. and Barber, Z. H. 1999. Microstructure modification of silver films deposited by ionized magnetron sputter deposition. J. Vac. Sci. Technol. A. 17(5) : 2891.

Diserens, M., Patscheider, J. and Levy, F. 1998. Improving the properties of titanium nitride by incorporation of silicon. Surf. Coat. Technol. 108-109 : 241-246.

Diserens, M., Patscheider, J. and Levy, F. 1999. Mechanical properties and oxidation resistance of nanocomposite TiN-SiNx physical-vapor-deposited thin films. Surf. Coat. Technol. 120-121 : 158-165.

Jedrzejowski, P., Klemberg-Sapieha, J. E. and Martinu, L. 2003. Relationship between the mechanical properties and the microstructure of nanocomposite TiN/SiN1.3 coatings prepared by low temperature plasma enhanced chemical vapor deposition. Thin Solid Films. 426 : 150-159.

Kim, S. H., Kim, J. K. and Kim, K. H. 2002. Influence of deposition conditions on the microstructure and mechanical properties of Ti-Si-N films by Dc reactive magenetron sputtering. Thin Solid Film. 420-421 : 360-365.

Martin, P. J. and Bendavid, A. 2003. Properties of Ti1-xSixNy films deposited by concurrent cathodic arc evaporation and magnetron sputtering. Surf. Coat. Technol. 163-164 : 245-250.

Meng,W. J., Zhang, X. D., Shi, B., Jiang, J. C., Rehn, L. E., Baldo, P. M. and Tittsworth, R. C. 2003. Structure and mechanical properties of Ti-Si-N ceramic nanocomposite coatings. Surf. Coat. Technol. 163-164 : 251-259.

Musil, J. and Vlcek, J. 2001. Magnetron sputtering of hard nanocomposite coating and their properties. Surf. Coat. Technol. 142-144 : 557-566.

Neiderhofer, A., Bolom, T., Nesladek, P.,Moto, K., Patil, D. S. and Veprek, S. 2001. The role of percolation threshold for the control of hardness and thermal stability of super- and ultrahard nanocomposites. Surf. Coat. Technol. 146-147 : 183-188.

Niederhofer, A., Nesladek, P., Mannling, H.-D., Moto, K., Veprek, S. and Jilek, M. 1999. Structural properties, internal stress and thermal stability of nc-TiN/-Si3N4, nc-TiN/TiSix and nc-(Ti1-yAlySix)N superhard nanocomposite coatings reaching the hardness of diamond. Surf. Coat. Technol.120-121 : 173-178.

Patscheider, J., Shizhi, L. and Veprek, S. 1996. Plasma induced deposition titanium nitride from TiCl4 in a direct current glow discharge. Chem. Plasma Proc. 16 : 341.

Rebouta, L., Travares, C. J., Aimo, R., Wang, Z., Pischow, K., Alves, E., Rojas, T. C., Odriozola, J. A. 2000. Hard nanocomposite Ti-Si-N coatings prepared byDC reactive magenetron sputtering. Surf. Coat.Technol. 133-134 : 234-239.

Rossnagel, S. M. and Hopwood, J. 1993. Magnetron Sputter Deposition with levels of metal ionization. Appl. Phys. Lett. 63 : 3285-3287.

Vaz, F., Rebouta, L., Goudeau, P., Pacaud, J., Garem, H., Rivere, J. P., Cavaleiro, A. and Alves, E. 2000. Characterisation of Ti1-xSixNy nanocomposite films. Surf. Coat. Technol. 133-134 : 307-313.

Vaz, F., Rebouta, L., Goudeau, Ph., Girardeau, T., Pacaud, J., Rivere, J. P. and Traverse, A. 2001. Structure transitions in hard Si-baed TiN coatings: the effect of bias voltage and temperature. Surf. Coat. Technol. 146-147 : 274-279.

Vaz, F., Rebouta, L., Almeida, B., Goudeau, P., Pacaud, J., Rivere, J. P. and Sousa, J. B. E. 1999. Structure analysi of Ti1-xSixNy nanocomposite films prepared by reactive magnetron sputtering. Surf. Coat. Technol. 120-121 : 166-172.

Veprek, S. 1999. The search for novel, superhard materials. J. Vac. Sci. Technol. A. 17(5) : 2401-2420.

Zhang, S., Sun, D., Fu, Y. and Du, H. 2003. Recent advances of superhard nanocomposite coatings: a review. Surf. Coat. Technol. 167 : 113-119.

Downloads

Published

2022-08-19

How to Cite

[1]
N. PHINICHKA, R. CHANDRA, and Z. H. BARBER, “Synthesized nanocomposite TiN/a-SiNx films”, J Met Mater Miner, vol. 13, no. 1, pp. 7–15, Aug. 2022.

Issue

Section

Original Research Articles

Most read articles by the same author(s)