Modification of optical and structural properties of DC magnetron sputtered tungsten oxide thin films for electrochromic application
Keywords:
Electrochromic, Tungsten oxide, Reactive DC magnetron sputteringAbstract
The optical properties of tungsten oxide thin films prepared by a reactive DC magnetron sputtering technique were investigated. The influences of O2 flow rates (15 and 18 sccm) and DC sputtering powers (5, 15 and 25 W) on the optical properties of 200 nm-thick tungsten oxide films on indium tin oxide substrates (WO3/ITO/glass) were investigated using UV-visible spectrophotometer. The results indicated that the transmission modulation in visible region between colored state and bleached state of the films increased significantly with decreasing DC sputtering power and increasing O2 flow rate. The results corresponded with the increase of film roughness and density which promoted the intercalation and deintercalation. The diffusion coefficient of the films was extracted from anodic peak current of cyclic voltammogram to determine the charge intercalation across the films. With the deposition power of 5 W and the O2 flow rate of 18 sccm, the films showed the highest transmission modulation and differential optical density in visible region of 23.35% and 0.223, respectively. This information provided an advantage for developing high performance of electrochromic devices.Downloads
References
K. Nakagawa, N. Miura, S. Matsumoto, R. Nakano and H. Matsumoto, “Electrochromism and Electronic Structures of Nitrogen Doped Tungsten Oxide Thin Films Prepared by RF Reactive Sputtering,” Japanese Journal of Applied Physics, vol. 47, pp. 7230-7235, 2008.
G. A. Niklasson, and C. G. Granqvist, “Electrochromics for smart windows: thin films of tungsten oxide and nickel oxide, and devices based on these,” Journal Materials Chemistry, vol. 17, pp. 127–156, 2007.
J. C. Chou, P. A. Ho, C. J. Yang and Y. H. Liao, “Photoelectric Characteristics and Equivalent Circuit Analysis of Flexible Tungsten Oxide Electrochromic Thin Film,” Journal of Display Technology, vol. 10, pp. 821-826, 2014.
G. F. Cai, D. Zhou, Q. Q. Xiong, J. H. Zhang, X. L. Wang, C.D. Gu and J. P. Tu, “Efficient electrochromic materials based on TiO2@WO3 core/shell nanorod arrays,” Solar Energy Materials and Solar Cells, vol. 117, pp.231-238, 2013.
H. M. A. Soliman, A. B. Kashyout, M. S. E. Nouby and A. M. Abosehly, “Preparation and characterizations of tungsten oxide electrochromic nanomaterials,” Journal of Materials Science: Materials in Electronics, vol. 21, pp. 1313- 1321, 2010.
C. Brigouleix, P. Topart, E. Bruneton, F. Sabary, G. Nouhaut and G. Campet, “Roll-to-roll pulsed de magnetron sputtering deposition of WO3 for electrochromic windows,” Electrochimica Acta, vol. 46, pp. 1931-1936, 2001.
X. Sun, Z. Liu and H. Cao, “Electrochromic properties of N-doped tungsten oxide thin films prepared by reactive DC-pulsed sputtering,” Thin Solid Films, vol. 519, pp. 3032-3036, 2011.
E. Washizu, A. Yamamoto, Y. Abe, M. Kawamura and K. Sasaki, “Optical and electrochromic properties of RF reactively sputtered WO3 films,” Solid State Ionics, vol. 165, pp. 175-180, 2003.
A. Subrahmanyam and A. Karuppasamy, “Optical and electrochromic properties of oxygen sputtered tungsten oxide (WO3) thin films.” Solar Energy Materials and Solar Cells, vol. 91, pp. 266-274, 2007.
Y. S. Lin, Y. L. Chiang and J. Y. Lai, “Effects of oxygen addition to the electrochromic properties of WO3 − z thin films sputtered on flexible PET/ITO substrates,” Solid State Ionics, vol. 180, pp. 99-105, 2009.
P. Losier and P. V. Ashrit, “Flash evaporated tungsten oxide thin films for electrochromic applications,” Journal of Materials Science Letters, vol. 22, pp. 1095-1098, 2003.
A. Lusis, J. Kleperis and E. Pentjuss, “Model of electrochromic and related phenomena in tungsten oxide thin films,” Journal of Solid State Electrochemistry, vol. 7, pp. 106-112, 2003.
E. Ozkan, S. H. Lee, C. E. Tracy, J. R. Pitts and S. K. Deb, “Comparison of electrochromic amorphous and crystalline tungsten oxide films,” Solar Energy Materials and Solar Cells, vol. 79, pp. 439-448, 2003.
H. C. Chen, D. J. Jan, C. H. Chen and K. T. Huang, “Bond and electrochromic properties of WO3 films deposited with horizontal DC, pulsed DC, and RF sputtering,” Electrochimica Acta, vol. 93, pp. 307-313, 2013.
K. Gesheva, A. Szekeres and T. Ivanova, “Optical properties of chemical vapor deposited thin films of molybdenum and tungsten based metal oxides,” Solar Energy Materials and Solar Cells, vol. 76, pp. 563-576, 2003.
J. Scarminio, M. A. Bica de Moraes, R. C. E. Dias, F. P. Rouxinol and S. F. Durrant, “tungsten oxide films of high electrochromic efficiencies obtained by deposition,” Electrochemical and Solid-State Letters, vol. 6, pp. H9-H12, 2003.
P. S. Patil, “Solution thermolysed tungsten oxide-based electrochromic devices: thicknessdependent step potential analysis,” Journal of Solid State Electrochemistry, vol. 6, pp. 284- 287, 2002.
M. Regragui, M. Addou, A. Outzourhit, E. El Idrissi, A. Kachouane and A. Bougrine, “Electrochromic effect in WO3 thin films prepared by spray pyrolysis,” Solar Energy Materials and Solar Cells, vol. 77, pp. 341- 350, 2003.
R. Sivakumar, A. M. E. Raj, B. Subramanian, M. Jayachandran, D. C. Trivendi and C. Sanjeeviraja, “Preparation and characterization of spray deposited n-type WO3 thin films for electrochromic devices,” Materials Research Bulletin, vol. 39, pp. 1479-1489, 2004.
T.-S. Yang, Z.-R. Lin and M.-S. Wong, “Structure and electrochromic properties of tungsten oxide films prepared by magnetron sputtering,” Applied Surface Science, vol. 252, pp. 2029-2037, 2005.
X. Sun, Z. Liu and H. Cao, “Effect of films density on electrochromic tungsten oxide thin films deposited by reactive de-pulsed magnetron sputtering,” Journal of Alloys and Compounds, vol. 504S, pp. S418-S421, 2010.
B. Liu, Q. H. L. Wen and X. Zhao, “The effect of sputtering power on the structure and photocatalytic activity of TiO2 films prepared by magnetron sputtering,” Thin Solid Films, vol. 517, pp. 6569-6575, 2009.
M. Weil and W.-D. Schubert, “The beautiful colors of tungsten oxides”, in International tungsten Industry Association, 4 Heathfield Terrace, London, 2013, pp. 1-12.
M. T. Le, Y. U. Sohn, J. W. Lim and G. S. Choi, “Effect of sputtering power on the nucleation and growth of cu films deposited by magnetron sputtering,” Materials Transactions, vol. 51, pp. 116-120, 2010.
N. Oka, M. Watanabe, K. Sugie, Y. Iwabuchi, H. Kotsubo and Y. Shigesato, “Reactive-gasflow sputter deposition of amorphous WO3 films for electrochromic devices,” Thin Solid Films, vol. 532, pp. 1-6, 2013.
B. Baloukas, J.-M. Lamarre and L. Martinu, “Electrochromic interference filters fabricated from dense and porous tungsten oxide films,” Solar Energy Material and Solar Cells, vol. 95, pp. 807-815, 2011.
A. Antonaia, T. Polichetti, M. L. Addonizio, S. Aprea, C. Minarini and A. Rubino, “Structure and optical characterization of amorphous and crystalline evaporated WO3 layers,” Thin Solid Films, vol. 354, pp. 73-81, 1999.
A. I. Inamdar, Y. S. Kim, B.U. Jang, H. Im, W. Jung, D.-Y. Kim and H. Kim, “Effects of oxygen stoichiometry on electrochromic properties in amorphous tungsten oxide films,” Thin Solid Films, vol. 520, pp. 5367-5371, 2012.
P. M. S. Monk, R. J. Mortimer and D. R. Rosseinsky, Electrochromism and Electrochromic Devices. Cambridge University Press, 2007.
X. G. Wang, Y. S. Jiang, N. H. Yang, L. Yuan and S. J. Pang, “Crystallinity and morphology changes of a-WO3 films,” Applied Surface Science, vol. 143, pp. 135-141, 1999.
G. kreysa, K.-I. Ota and R. Savinell, Encyclopedia of Applied Electrochemistry. Springer New York Heidelberg Dordrecht London, 2014.
Downloads
Published
How to Cite
Issue
Section
License
Copyright (c) 2019 Journal of Metals, Materials and Minerals
This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
Authors who publish in this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this journal.