Effect of sputtering power on the structure of DC magnetron sputtered vanadium nitride thin films
Keywords:
Vanadium nitride, Thin films, DC magnetron sputtering, Sputtering powerAbstract
Vanadium nitride (VN) thin films were deposited on Si substrates by reactive DC unbalanced magnetron sputtering. Effect of sputtering power on the structure of the as-deposited films was investigated. The crystal structure, thickness, roughness, surface morphology and chemical composition of the films were characterized by X-ray diffraction (XRD), atomic force microscopy (AFM), field emission scanning electron microscopy (FE-SEM) and energy dispersive X-ray spectroscopy (EDS), respectively. The results showed that the as-deposited VN thin films had fcc structure with (111), (200) and (220) planes, varying with the sputtering power. The crystallite size and lattice constant of films were in the range of 16 – 49 nm and 4.119 – 4.147 Å, respectively. The film thickness and roughness increased with increasing of the sputtering power, from 275 nm to 830 nm and 3 nm to 12 nm, respectively. The as-deposited films compose of vanadium and nitrogen in different ratios, depending on the sputtering power. Cross section analysis by FE-SEM showed a compact columnar structure.
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Xiangbo, L., Huibin, L., Meng, H., Kuijuan, J., Guozhen, Y., Hao, N. and Kun, Z. (2014). Epitaxial growth of vanadium nitride thin films by laser molecule beam epitaxy. Mater. Lett. 123: 38-40.
Glaser, A., Surnev, S., Netzer, F.P., Fateh N., Fontalvo, G.A. and Mitterer C. (2007). Oxidation of vanadium nitride and titanium nitride coatings. Surf. Sci. 601: 1153-1159.
Luyang, C., Yunle, G., Liang, S., Zeheng, Y., Jianhua, M. and Yitai, Q. (2004). A room-temperature synthesis of nanocrystalline vanadiumnitride. Solid. State. Commun. 132: 343-346.
Parkin, I.P. and Elwin G.S. (2001). Atmospheric pressure chemical vapour deposition of vanadium nitride and oxynitride films on glass from reaction of VCl4 with NH3. J. Mater. Chem. 11: 3120-3124.
Matei Ghimbeu, C., Sima, F., Ostaci, R.V., Socol, G., Mihailescu, I.N. and VixGuterl, C. (2012). Crystalline vanadium nitride ultra-thin films obtained at room temperature by pulsed laser deposition. Surf. Coat. Technol. 211: 158-162.
Ma, C.H., Huang, J.H. and Chen H. (2000). A study of preferred orientation of vanadium nitride and zirconium nitride coatings on silicon prepared by ion beam assisted deposition. Surf. Coat. Technol. 133–134: 289-294
Suszko, T., Gulbiński, W., Urbanowicz A. and Gulbiński, W. (2011). Preferentially oriented vanadium nitride films deposited by magnetron sputtering. Mater. Lett. 65: 2146-2148.
Wiklund, U., Casas, B. and Stavlid, N. (2006). Evaporated vanadium nitride as a friction material in dry sliding against stainless steel. Wear. 261(1): 2-8.
Shum, P.W., Li, K.Y. and Shen, Y.G. (2005). Improvement of high-speed turning performance of Ti–Al–N coatings by using a pretreatment of high-energy ion implantation. Surf. Coat. Tech. 198: 414-419.
Chan, K.Y. and Teo, B.S. (2006). Atomic force microscopy (AFM) and X-ray diffraction (XRD) investigations of copper thin films prepared by dc magnetron sputtering technique. Microelectron. J. 37: 1064-1071.
Le, M.T., Yong, U., Sohn, Lim, J.W. and Choi, G.S. (2010). Effect of Sputtering Power on the Nucleation and Growth of Cu Films Deposited by Magnetron Sputtering. Mater. Trans. 51: 116-120.
Andujar, J.L., Pino F.J., Polo, M.C., Pinyol A., Corbella C. and Bertran, E. (2002). Effects of gas pressure and r.f. power on the growth and properties of magnetron sputter deposited amorphous carbon thin films. Diamond Relat. Mater. 11 : 1005-1009.
Zhang, D.H., Yang, T.L., Ma, J., Wang, Q.P., Gao, R.W. and Ma, H.L. (2000). Preparation of transparent conducting ZnO:Al films on polymer substrates by r. f. magnetron sputtering. Appl. Surf. Sci. 158: 43-48. 1
Thornton, J.A. (1974). Influence of apparatus geometry and deposition conditions on the structure and topography of thick sputtered coatings. J. Vac. Sci. Technol. 11 : 666-670.
Dhivya, P., Prasad, A.K. and Sridharan, M. (2015. Effect of sputtering power on the methane sensing properties of nanostructured cadmium oxide films. J. Alloys Compd. 620: 109-115.
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