Preparation of transparent alumina thin films deposited by RF magnetron sputtering


  • Busarin NOIKAEW Expert Centre of Innovative Materials, Thailand Institute of Scientific and Technological Research, Pathum Thani, 12120, Thailand
  • Laksana WANGMOOKLANG Expert Centre of Innovative Materials, Thailand Institute of Scientific and Technological Research, Pathum Thani, 12120, Thailand
  • Saisamorn NIYOMSOAN Integrated & Innovative Jewelry Materials Research Unit, Faculty of Gems, Burapha University, Chanthaburi, 22170, Thailand
  • Siriporn LARPKIATTAWORN Expert Centre of Innovative Materials, Thailand Institute of Scientific and Technological Research, Pathum Thani, 12120, Thailand



Aluminium oxide, scratch resistance, oxygen gas, RF magnetron sputtering


Alumina (Al2O3) thin films were prepared by RF magnetron sputtering technique using Al2O3 ceramic target. Effects of sputtering powers and oxygen gas mixtures were investigated and the optimized coating condition was applied on semi-precious gemstones. RF sputtering powers were varied to optimize the transparency of the films. Besides, the oxygen gas mixtures were also studied at the optimized sputtering power with a constant sputtering pressure. Optical and physical properties of the thin films were investigated using UV-Vis Spectrophotometer, FESEM, XRF, GIXRD, XRR including a microscratch tester. The Al2O3 films were highly transparent in the visible region in form of an amorphous phase with granular structure of the surface morphology. Thickness of the films decreased significantly with an introduction of the oxygen gas in the sputtering process but slowly decreased with further addition of the oxygen gas. Density of the film changed linearly with the variation of the oxygen gas mixtures. The semi-precious gemstones gained higher scratch resistance after the Al2O3 thin films coating. To enhance the scratch resistance and maintain the aesthetic appearance of the semi-precious gemstones, the most optimum deposition condition for the Al2O3 thin film coating was determined for the RF magnetron sputtering technique at room temperature.


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I. Safi, “Recent aspects concerning DC reactive magnetron sputtering of thin films: A review,” Surface and Coatings Technology, vol. 127, pp. 203-219, 2000. DOI:

G. Zheng, X. Cheng, X. Yang, R. Xu, J. Zhao, and G. Zhao, “Self-organization wear characteristics of MTCVD-TiCN-Al2O3 coated tool against 300M steel,” Ceramics International, vol. 43, pp. 13214-13223, 2017. DOI:

N. Witit-Anun, and A. Buranawong, “Effect of sputtering power on the structure of DC magnetron sputtered vanadium nitride thin films,” Journal of Metals, Materials and Minerals, vol. 27(1), pp. 47-52, 2017.

P. Laha, A. B. Panda, S.K. Mahapatra, P. K. Barha, A. K. Das, and I. Banerjee, “Development of rf plasma sputtered Al2O3–TiO2 multilayer broad band antireflecting coatings and its correlation with plasma parameters, Applied Surface Science, vol. 258, pp. 2275-2282, 2012. DOI:

B. P. Dhonge, T. Mathews, S. T. Sundari, C. Thinaharan, M. Kamruddin, S. Dash, and A. K. Tyagi, “Spray pyrolytic deposition of transparent aluminum oxide (Al2O3) films,” Applied Surface Science, vol. 258, pp. 1091-1096, 2011. DOI:

J. Gottmann, and E.W. Kreutz, “Pulsed laser deposition of alumina and zirconia thin films on polymers and glass as optical and protective coatings,” Surface and Coatings Technology, vol. 116-119, pp. 1189-1194, 1999. DOI:

S. Prasanna, G. Mohan Rao, S. Jayakumar, M. D. Kannan, and V. Ganesan, “Dielectric properties of DC reactive magnetron sputtered Al2O3 thin films,” Thin Solid Films, vol. 520, pp. 2689-2694, 2012. DOI:

A. K. Hussain, and U-M. B. Al Naib, “Recent developments in graphene based metal matrix composite coatings for corrosion protection application: A review,” Journal of Metals, Materials and Minerals, vol. 29(3), pp. 1-9, 2019.

J. A. García-Valenzuela, R. Rivera, A. B. Morales-Vilches, L. G. Gerling, A. Caballero, J. M. Asensi, C. Voz, J. Bertomeu, and J. Andreu, “Main properties of Al2O3 thin films deposited by magnetron sputtering of an Al2O3 ceramic target at different radio-frequency power and argon pressure and their passivation effect on p-type c-Si wafers,” Thin Solid Films, vol. 619, pp. 288-296, 2016. DOI:

A. Wiatrowski, S. Patela, P. Kunicki, and W. Posadowski, “Effective reactive pulsed magnetron sputtering of aluminium oxide-properties of films deposited utilizing automated process stabilizer,” Vacuum, vol. 134, pp. 54-62, 2016. DOI:

P. Yaemsanguansak, M. Sittishoktram, R. Tuayjaroen, E. Ketsombun, T. Lertvanithphol, C. Luangchaisri, and T. Jutarosaga, “Modification of optical and structural properties of DC magnetron sputtered tungsten oxide thin films for electrochromic application,” Journal of Metals, Materials and Minerals, vol. 29(2), pp. 79-86, 2019.

D. C. Miller, R. R. Foster, S.-H. Jen, J. A. Bertrand, S. J. Cunningham, A. S. Morris, Y.-C. Lee, S. M. George, and M. L. Dunn, “Thermo-mechanical properties of alumina films created using the atomic layer deposition technique,” Sensors and Actuators A, vol. 164, pp. 58-67, 2010. DOI:

P. Boryło, K. Lukaszkowicz, M. Szindler, J. Kubacki, K. Balin, M. Basiaga, and J. Szewczenko, “Structure and properties of Al2O3 thin films deposited by ALD process,” Vacuum, vol. 131, pp. 319-326, 2016. DOI:

A. B. Khatibani, and S. M. Rozati, “Growth and molarity effects on properties of alumina thin films obtained by spray pyrolysis,” Materials Science in Semiconductor Processing, vol. 18, pp. 80-87, 2014. DOI:

S. Suchat, J. Potisart, S. Supprakob, G. Gitgeatpong, and P. Prachopchok, “Comparison of ZnO film prepared by spray pyrolysis and screen printing methods,” Journal of Metals, Materials and Minerals, vol. 29(1), pp. 58-62, 2019.

B. P. Dhonge, T. Mathews, N. Kumar, P. K. Ajikumar, I. Manna, S. Dash, and A. K. Tyagi, “Wear and oxidation resistance of combustion CVD grown alumina films,” Surface and Coatings Technology, vol. 206, pp. 4574-4579, 2012. DOI:

K. Wirandorn, N. Panyayao, and V. Siriwongrungson, “Characterization and photocatalytic activity of titanium dioxide deposited on stainless steel by pulsed-pressure MOCVD,” Journal of Metals, Materials and Minerals, vol. 28(2), pp. 76-82, 2018.

C. Breeding, A. Shen, S. Eaton-Magaña, G. Rossman, J. Shigley, and A. Gilbertson, “Developments in gemstone analysis techniques and instrumentation during the 2000s,” Gems & Gemology, vol. 46(3), pp. 241-257, 2010. DOI:

A. H. Shen, W. Wang, M. S. Hall, S. Novak, S. F. McClure, J. E. Shigley and T. M. Moses, “Serenity coated colored diamonds: Detection and durability,” Gems & Gemology, vol. 43(1), pp.16-33, 2007. DOI:

H. Gabasch, F. Klauser, E. Bertel, and T. Rauch, “Coloring of topaz by coating and diffusion processes:An X-ray photoemission study of what happens beneath the surface,” Gems & Gemology, vol. 44(2), pp. 148-154, 2008. DOI:

S. Eaton-Magaña, and K. M. Chadwick, “Cubic zirconia reportedly coated with nanocrystalline synthetic diamond”, Gems & Gemology, vol. 45(1), pp.53-54, 2009.

J. Shigley, A. Gilbertson, and S. Eaton-magaña, “Characterization of colorless coated cubic zirconia (diamantine),” Gems & Gemology, vol. 48(1), pp. 18-30, 2012. DOI:

S. Tang, J. Su, T. Lu, Y. Ma, J. Ke, Z. Song, J. Zhang, and H. Liu, “A thick overgrowth of CVD synthetic diamond on a natural diamond,” The Journal of Gemmology, vol. 36(2), pp. 134-141, 2018. DOI:

S. Niyomsoan, C. Prapaipong, D. Boonyawan, and C. Umongno, “Synthesis and characterization of alumina thin film on semi-precious stones by plasma enhanced atomic layer deposition (PE-ALD),” Proceeding of International Conference on Radiation and Emission in Materials (ICREM 2018),20-23 November 2018, pp. 28-33, 2018, Chiang Mai, Thailand.

C. Prapaipong, S. Niyomsoan, D. Boonyawan, and C. Umongno, “Alumina thin film synthesis for improving semi-precious stone quality with plasma enhanced atomic layer deposition (PE-ALD,” The 9th RMUTP International Conference on Science, Technology and Innovation for Sustainable Development: Challenges Towards the Digital Society, 21-22 June 2018, pp. 42-55, The Sukosol, Thailand, 2018.

S. Niyomsoan, C. Chomsaeng, S. Intarasiri, and D. Boonyawan, “Surface protective thin film on semi-precious gemstones by plasma-enhanced atomic layer (PE-ALD),” Proceedings of Burapha University International Conference 2016, July 28-29, pp. 305-312. Pattaya: Burapha University, 2016.

G. Balakrishnan, R. Venkatesh Babu, K. S. Shin and J. I. Song, “Growth of highly oriented γ- and α-Al2O3 thin films by pulsed laser deposition,” Optics and Laser Technology, vol. 56, pp. 317-321, 2014. DOI:

M. M. Singh, H. Kumar, and P. Sivaiah, “Alumina thin film

coatings at optimized conditions using RF magnetron sputtering process,” International Journal of Thin Films Science and Technology, vol.10(1), pp13-20, 2021. DOI:

G. Angarita, C. Palacio, M. Trujillo, and M. Arroyave, “Synthesis of alumina thin films using reactive magnetron sputtering method,” Journal of Physics: Conf. Series, vol. 850, pp. 012022, 2017. DOI:

X. Tang, Z. Li, H. Iiao, and J. Zhang, “Growth of ultrathin Al2O3 films on n-inp substrates as insulating layers by RF magnetron sputtering and study on the optical and dielectric properties,” Coatings, vol. 9, pp. 341, 2019. DOI:

E. Turgut, Ö. Çoban, S. Sarıtaş, S. Tüzemen, M. Yıldırım, and E. Gür, “Oxygen partial pressure effects on the RF sputtered p-type NiO hydrogen gas sensors,” Applied Surface Science, vol. 435, pp, 880-885, 2018. DOI:

P. Mach, M. Kocián, and J. Kolářová, “Study of sputtering process of alumina thin films,” Proceedings of the 36th International Spring Seminar on Electronics Technology, 8-12 May 2013, pp 247-252, 2013. DOI:

E. Wallin, Alumina Thin Films from Computer Calculations to Cutting Tools. Linköping University, Sweden, 2008.

M. Ahmadipour, S. N. Ayub, M. F. Ain, and Z. A. Ahmad, “Structural, surface morphology and optical properties of sputter-coated CaCu3Ti4O12 thin film: Influence of RF magnetron sputtering power,”Materials Science in Semiconductor Processing, vol. 66, pp. 157-161, 2017. DOI:

Q. X. Guo, T. Tanaka, M. Nishio, and H. Ogawa, “Growth properties of AlN films on sapphire substrates by reactive sputtering,” Vacuum, vol. 80(7), pp. 716-718, 2006. DOI:

A. Iqbal, and F. Mohd-Yasin, “Reactive sputtering of aluminum nitride (002) thin films for piezoelectric applications: A review,” Sensors, vol. 18, pp. 1797, 2018. DOI:

B. Chapman, Glow discharge processes: Sputtering and plasma etching, 1st Edition, Kindle Edition, Wiley-interscience publication, John wiley & sons,1980.

Y. Zhao , H. Wang, F. Yang, Z. Wang, J. Li, Y. Gao, Z. Feng, X. Li, and Z. Zhen, “Sputtering power induced physical property variation of nickel oxide films by radio frequency magnetron sputtering,” Mat. Res., vol. 21(2), pp. e20170836, 2018. DOI:

C. H. Heo, S.-B. Lee, and J.-H. Boo, “Deposition of TiO2 thin films using RF magnetron sputtering method and study of their surface characteristics,” Thin Solid Films, vol. 475, pp. 183-188, 2005. DOI:

R. Chakraborty, A. Dey, and A. K. Mukhopadhyay, “Loading rate effect on nanohardness of soda-lime-silica glass,” Metall Mater Trans A, vol. 41, pp. 1301-1312, 2010. DOI:

J-H Kim, J-H Lee, Y-W Heo, J-J Kim, and J-O Park, “Effects of oxygen partial pressure on the preferential orientation and surface morphology of ITO films grown by RF magnetron sputtering,” Journal of Electroceramics, vol. 23, pp. 169-174, 2009. DOI:

R. Grayeli Korpi, S. Rezaee, C. Luna, Ş. Ţălu, A. Arman, and A. Ahmadpourian, “Influence of the oxygen partial pressure on the growth and optical properties of RF-sputtered anatase TiO2 thin films,” Results in Physics, vol. 7, pp. 3349-3352, 2017. DOI:

H. Fujiyama, T. Sumomogi, and T. Endo, “Effect of O2 gas partial pressure on mechanical properties of SiO2 films deposited by radio frequency magnetron sputtering,” Journal of Vacuum Science & Technology A, vol. 20(2), pp. 356-361, 2002. DOI:




How to Cite

B. NOIKAEW, L. WANGMOOKLANG, S. NIYOMSOAN, and S. LARPKIATTAWORN, “Preparation of transparent alumina thin films deposited by RF magnetron sputtering”, J Met Mater Miner, vol. 31, no. 2, pp. 96–103, Jun. 2021.



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