Effect of nitrogen partial pressure on characteristic and mechanical properties of hard coating TiAlN Film

Authors

  • Chaiwat Chokwatvikul Division of Materials Technology, School of Energy, Environment and Materials, King Mongkut's University of Technology Thonburi
  • Siriporn Larpkiattaworn Department of Materials Innovation, Thailand Institute of Scientific and Technological Research (TISTR)
  • Surasak Surinphong NanoShield PVD Hard Coating
  • Chumphol Busabok Department of Materials Innovation, Thailand Institute of Scientific and Technological Research (TISTR)
  • Preecha Termsuksawad Division of Materials Technology, School of Energy, Environment and Materials, King Mongkut's University of Technology Thonburi

Keywords:

(Ti,Al)N film, PVD, Cathodic Arc

Abstract

(Ti,Al)N coating has been serving for the industry as cutting and forming tools. Compared with TiN film, TiAlN film significantly increases tool lifetime. Therefore, it reduces machine downtime and increases productivity. In this work, (Ti,Al)N film was deposited on cold-work tool steel (SKD 11) using PVD cathodic arc system. The sintered Ti-Al target with composition of (at%) 50 Ti and 50 Al was used as a cathode. The deposition bias voltage, bias arc current and deposition time were set at 100 V, 70 A and 90 minutes, respectively. Nitrogen gas was purged into the system with the applied pressure of 1, 1.5 and 2 Pa, respectively. After coating, the film was characterized for crystal structures and mechanical properties. It was found that all films have the same crystal structures of Ti0.5Al0.5N and TiN0.5 with the thickness in the range of 2-3 μm. Moreover, the film prepared at N2 pressure of 1.5 Pa possesses the highest hardness (48 GPa), high adhesion strength (>150 N), and good adhesion (HF1 class). The difference of hardness and adhesion of the film was found to be resulted by size and dispersion of macroparticles.

Downloads

Download data is not yet available.

References

Hsu, C.H., Lee, C.C. & Ho, W.Y. (2008). Filter effects on the wear and corrosion behaviors of arc deposited (Ti,Al)N coatings for application on cold-work tool steel. Thin Solid Films 516(15): 4826-4832.

Kimura, A., Hasegawa, H., Yamada, K. & Suzuki, T. (1999). Effects of Al content on hardness, lattice parameter and microstructure of Ti1-xAlxN films. Surf. Coat. Tech. 120- 121: 438-441.

Ohnuma, H., Nihira, N., Mitsuo, A., Toyoda, K., Kubota, K. & Aizawa, T. (2004). Effect of aluminum concentration on friction and wear properties of titanium aluminum nitride films. Surf. Coat. Tech. 177-178: 623-626.

Randhawa, H., Johnson, P.C. & Cunningham, R. (1988). Deposition and characterization of ternary nitrides. J. Vac. Sci. Technol. A 6(3): 2136-21398

Wo, P.C., Munroe, P.R., Zhou, Z.F., Li, K.Y. & Xie, Z.H. (2010). Effects of TiN sublayers on the response of TiSiN nanocomposite coatings to nanoidentation and scratching contacts. Mat. Sci. Eng. A-Struct. 527(16- 17): 4447-4457.

Kimura, A., Murakami, T., Yamada, K. & Suzuki, T. (2001). Hot-pressed Ti-Al targets for synthesizing Ti1-xAlxN films by the arc ion plating method. Thin Solid Films 382(1-2): 101-105.

Münz, W.D. (1986). Titanium aluminum nitride films: A new alternative to TiN coatings. J. Vac. Sci. Technol. A 4(6): 2717-2725.

Knotek, O., Münz, W. D. & Leyendecker, T. (1987). Industrial deposition of binary, ternary, and quaternary nitrides of titanium, zirconium, and aluminum. J. Vac. Sci. Technol. A 5(4): 2173-2179.

Larpkiattaworn, S., lkeuchi, J. & Eamchotchawalit, C. (2009). Comparison of properties of titanium aluminum nitride film produced by using two different types of Ti-Al target. Surf. Interface Anal. 41: 794-798.

Cheng, Y.H., Tay, B.K., Lau, S.P., Shi, X. & Chua, H.C. (2000). Deposition of (Ti,Al)N films by filtered cathodic vacuum arc. Thin Solid Films 379(1-2): 76-82.

Bujak, J., Walkowicz, J. & Kusinski. J. (2004). Influence of the nitrogen pressure on the structure and properties of (Ti,Al)N coatings deposited by cathodic vacuum arc PVD process. Surf. Coat. Tech. 180-181: 150-157.

Chokwatvikul, C. Surinphong, S. Busabok, C. Termsuksawad, P. & Larpkiattaworn, S. (2010). Characterization of (Ti,Al)N thin film coated by PVD cathodic arc using TiAl target. Adv. Mat. Res. 93-94: 276-279.

Weber, F.R., Fontaine, F., Scheib, M. & Bock, W. (2004). Cathodic arc evaporation of (Ti,Al)N coatings and (Ti,Al)N/TiN multilayer-coatingscorrelation between lifetime of coated cutting tools, structural and mechanical film properties. Surf. Coat. Tech. 177-178: 227-232.

Ahlgren, M. & Blomqvist, H. (2005). Influence of bias variation on residual stress and texture in TiAlN PVD coatings. Surf. Coat. Tech. 200(1-4): 157-160.

Yang, M.H., Wen, J.C., Chen, K.L., Chen, S.Y. & Leu, M.S. (2005). Deposition of indium tin oxide thin films by cathodic arc ion plating. Thin Solid Films 484(1-2): 39- 45.

Downloads

Published

2011-06-30

How to Cite

[1]
C. Chokwatvikul, S. Larpkiattaworn, S. Surinphong, C. Busabok, and P. . Termsuksawad, “Effect of nitrogen partial pressure on characteristic and mechanical properties of hard coating TiAlN Film”, J Met Mater Miner, vol. 21, no. 1, Jun. 2011.

Issue

Vol. 21 No. 1 (2011)

Section

Original Research Articles

License

Copyright (c) 2017 Journal of Metals, Materials and Minerals

Creative Commons License

This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.

Authors who publish in this journal agree to the following terms:

    1. Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this journal.

 

    1. Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this journal.

Most read articles by the same author(s)