Oxidation behavior of Sn-1 wt% Bi alloy in air and deionized water at room temperature
Keywords:Electrochemical analysis, Thickness of tin oxide film, Oxidation of tin, X-ray photoelectron spectroscopy
Formation of tin oxides on surface Sn-1 wt% Bi alloy lapping plates causes interactions with protrusions of embedded diamond grits, and reduces the efficiency of the lapping process. The rate and type of oxide formation were investigated to understand the problem. Electrochemical analysis was performed to characterize the oxide film thickness, and x-ray photoelectron spectroscopy was performed to characterize the tin oxide species. Oxidation in air at room temperature reaches a thickness of 23 Å after 72 h. Oxidation in deionized water at room temperature has a faster growth rate, and reaches a thickness of 33 Å after 72 h. An oxides formation model is proposed for this tin alloy composition. The first layer is either a very thin layer or comprises clusters of SnO2. The second layer is a thick and continuous SnO layer. The third layer is a mixture of the two types of oxides. Oxidation either in air or in deionized water at room temperature starts with a linear growth law, and changes to a parabolic growth law after the SnO layer reaches a critical thickness. There is a possibility of SnO to SnO2 transformation that causes thickness reduction.
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