A study of the electrical and optical properties of AZO thin film by controlling pulse frequency of HiPIMS
DOI:
https://doi.org/10.55713/jmmm.v33i2.1696Keywords:
AZO thin film, HiPIMS, Pulse frequency, Transparent conductive oxidesAbstract
The transparent conductive oxide (TCO) which is AZO thin film was prepared by controlling pulse frequency at 100 Hz to 900 Hz using high-power impulse magnetron sputtering (HiPIMS). All samples were deposited on silicon (100) and glass slide substrates which the thickness was kept constant at 400 nm. The surface morphology was investigated by field-emission scanning electron microscope (FE-SEM), crystallinity by Grazing Incidence X-ray Diffraction (GI-XRD), optical transparency by UV-Vis-NIR spectrophotometry, and electrical properties using Hall effect instrument. It was found that the AZO films exhibited dense columnar structure. The GI-XRD patterns of AZO films demonstrated the crystal growth direction which was preferred the hexagonal wurtzite structure at (002) and (103) planes. The AZO film prepared by using 700 Hz of frequency (duty cycle 7%) showed the average visible transmittance (Tavg) at 82% in the visible region (380 nm to 780 nm). Additionally, the resistivity, high mobility and carrier concentration of AZO film were found to be 3.0 × 10-3 Ω.cm-1, 10.53 cm2∙Vs-1 and 1.82 × 1020∙cm-3, respectively. The fabrication of AZO film presented excellent electrical and optical properties which could be applied in several optoelectronic applications.
Downloads
References
M. Mohamedi, F. Challali, T. Touam, A. Chelouche, S. Ouhenia, A. H. Souici, and D. Djouadi, “AZO thin films grown by confocal RF sputtering: role of deposition time on microstructural, optical, luminescence and electronic properties,” Journal of Materials Science: Materials in Electronics, vol. 32, pp. 25288-25299, 2021.
M. Asemi, M. Ahmadi, and M. Ghanaatshoar, “Preparation of highly conducting Al-doped ZnO target by vacuum heat treatment for thin film solar cell applications,” Ceramics International, vol. 44, pp. 12862-12868, 2018.
H. Kim, A. Pique, J.S. Horwitz, H. Murata, Z.H. Kafafi, C.M. Gilmorea, and D.B. Chrisey, “Effect of aluminum doping on zinc oxide thin films grown by pulsed laser deposition for organic light-emitting devices,” Thin Solid Films, vol. 377, pp. 798-802, 2000.
T. Minami, “Transparent conducting oxide semiconductors for transparent electrodes. Semicond,” Semiconductor Science and Technology, vol. 20, pp. 35-44, 2005.
R. A. Afre, N. Sharma, and M. Sharon, “Transparent conducting oxide films for various applications: A review,” Reviews on Advanced Materials Science, vol. 53, pp. 79-89, 2018.
K. Seawsakul, M. Horprathum, P. Eiamchai, V. Pattantsetakul, S. Limwichean, P. Muthitamongkol, C. Thanachayanont, and P. Songsiriritthigul, “Transparent conductive nanocolumnar AZO film coating by glancing angle deposition technique,” AIP Conference Proceedings 2010, 020017, 2018.
K. Yim, and C. Lee, “Optical properties of Al-doped ZnO thin films deposited by two different sputtering methods,” Crystal Research and Technology, vol. 41, pp. 1198-1202, 2006.
A.V. Singh, M. Kumar, RM. Mehra, A. Wakahara, and A. Yoshida, “Al-doped zinc oxide (ZnO: Al) thin films by pulsed laser ablation,” Journal of the Indian Institute of Science, vol. 81, pp. 527-533, 2001.
K. Necib, T. Touam, A. Chelouche, L. Ouarez, D. Djouadi, and B. Boudine, “Investigation of the effects of thickness on physical properties of AZO sol-gel films for photonic device applica- tions,” Journal of Alloys and Compounds, vol. 735, pp. 2236-2246, 2018.
M. Humayan Kabir, M. Mintu Ali, M. Abdul Kaiyum, and M.S. Rahman, “Effect of annealing temperature on structural mor- phological and optical properties of spray pyrolized Al-doped ZnO thin films,” Journal of Physics Communications, vol. 3, pp. 105007, 2019.
S. Saini, P. Mele, T. Oyake, J. Shiomi, J.-P. Niemela, M. Karppinen, K. Miyazaki, C. Li, T. Kawaharamura, and A. Ichi-nose, “Porosity-tuned thermal conductivity in thermoelectric Al-doped ZnO thin films grown by mist-chemical vapor deposition,” Thin Solid Films, vol. 685, pp. 180-185, 2019.
L. Ma, X. Ai, H. Quan, W. Yang, and X. Du, “Resistivity depends on preferred orientation for transparent conductive thin films,” Journal of the Korean Physical Society, vol. 74, pp. 806-811, 2019.
Y. Xia, P. Wang, S. Shi, M. Zhang, G. He, J. Lv, and Z. Sun, “Deposition and characterization of AZO thin films on flexible glass substrates using DC magnetron sputtering technique,” Ceramics International, vol. 43, pp. 4536-4544, 2017.
K.Seawsakul, M. Horprathum, P. Eiamchai, V. Pattantsetakul, S. Limwichean, P. Muthitamongkol, C. Thanachayanont, and P. Songsiriritthigul, “Effects of sputtering power toward the Al-doped ZnO thin Film prepared by pulsed DC magnetron sputtering,” Materials Today: Proceedings, vol. 4, pp. 6466-6471, 2017.
D. Mendil, F. Challali, T. Touam, V. Bockele ́e, S. Ouhenia, A. Souici, D. Djouadi, and A. Chelouche, “Preparation of RF sput-tered AZO/Cu/AZO multilayer films and the investigation of Cu thickness and substrate effects on their microstructural and optoelectronic properties,” Journal of Alloys and Compounds, vol. 860, pp. 158470, 2020.
V. Kouznetsov, K. Macak, J. M. Schneider, U. Helmersson, and I. Petrov, “A novel pulsed magnetron sputter technique utilizing very high target power densities,” Surface and Coatings Technology, vol. 122, pp. 290-293, 1999.
D. V. Mozgrin, I. K. Fetisov, and G. V. Khodachenko, “High-current low-pressure quasi-stationary discharge in a magnetic field: experimental research,” Plasma Physics Reports, vol. 21, pp. 400-409, 1995.
S. P. Bugaev, N. N. Koval, N. S. Sochugov, and A. N. Zakharov, “Investigation of a high-current pulsed magnetron discharge initiated in the low-pressure diffuse arc plasma,” Proceedings of 17th International Symposium on Discharges and Electrical Insulation in Vacuum, vol. 2, pp. 1074-1076, 1996.
K. Mac ́ak, V. Kouznetsov, J. Schneider, U. Helmersson, and I. Petrov, “Ionized sputter deposition using an extremely high plasma density pulsed magnetron discharge,” Journal of Vacuum Science & Technology A, vol. 18, pp. 1533-1537, 2000.
A. P. Ehiasarian, R. New, W. D. Munz, L. Hultman, U. Helmersson, and V. Kouznetsov, “Influence of high power densities on the composition of pulsed magnetron plasmas,” Vacuum, vol. 65, pp. 147-154, 2002.
J. T. Gudmundsson, J. Alami, and U. Helmersson, “Evolution of the electron energy distribution and plasma parameters in a pulsed magnetron discharge,” Applied Physics Letters, vol. 78, pp. 3427-3429, 2001.
S. Kment, P. Schmuki, Z. Hubicka, L. Machala, R. Kirchgeorg, N. Liu, and L. Wang, K., Efficiency of thin hematite films exhibiting solely (110) crystal orientation,” ACS Nano, vol. 9, pp. 7113-7123, 2015.
S. Limwichean, P. Eiamchai, P. Chatchai, N. Kasayapanand, and M. Horprathum, “Comparative investigations of DCMS/ HiPIMS reactively sputtered WO3 thin films for photo-electrochemical efficiency enhancements,” Vacuum, vol. 185, pp. 109978, 2021.
U. Helmersson, M. Lattemann, J. Bohlmark, A. P. Ehiasarian, and J. T. Gudmundsson, “Review Ionized physical vapor deposition (IPVD): A review oftechnology and applications,” Thin Solid Films, vol. 513, pp. 1-24, 2006.
C-L. Chang, G-J. Luo, F-C. Yang, and J-F. Tang, “Effects of duty cycle on microstructure of TiN coatings prepared using CAE/HiPIMS,” Vacuum, vol. 192, p. 110449, 2021.
C-L. Chang, S-G. Shih, P-H. Chen, W-C. Chen, C-T. Ho, and W-Y. Wu, “Effect of duty cycles on the deposition and characteristics of high power impulse magnetron sputtering deposited TiN thin films,” Surface & Coatings Technology, vol. 259, pp. 232-237, 2014.
J. W. Bradley, A. Mishra, and P. J. Kelly, “The effect of changing the magnetic field strength on HiPIMS deposition rates,” Journal of Physics D: Applied Physics, vol. 48, p. 215202, 2015.
K. Seawsakul, M. Horprathum, P. Eiamchai, V. Pattantsetakul, S. Limwichean, C. Chananonnawathorn, P. Muthitamongkol, C. Thanachayanont, A. Klamchuen, T. Wutikhun, H. Nakajima, M. Sripakdee, and P. Songsiriritthigul, “Influence of vacuum annealing temperature on structural, optical and electrical of nanocolumnar AZO films for TCO application,” Chiang Mai Journal of Science, vol. 47, no. 4, pp. 815-822, 2020.
H. Mei, J. C. Ding, X. Xiao, Q. Luo, R. Wang, Q. Zhang, W. Gong, and Q. Wang, “Influence of pulse frequency on microstructure and mechanical properties of Al-Ti-V-Cu-N coatings deposited by HIPIMS,” Surface and Coatings Technology, vol. 205, p. 126514, 2021.
X. Lv, Y. Cao, L. Yan, Y. Li, Y. Zhang, and L. Song, “Atomic layer deposition of V1−xMoxO2 thin films, largely enhanced luminous transmittance, solar modulation,” ACS Appl. Mater. Interfaces, vol. 10, pp. 6601-6607, 2018.
Y. K. Tseng, G. J. Gao, and S. C. Chien. “Synthesis of c-axis preferred orientation ZnO:Al transparent conductive thin films using a novel solvent method.” Thin Solid Films, vol. 518, pp. 6259-6263, 2010.
F. Khan, Vandana, S. N. Singh, M. Husain, and P. K. Singh. “Sol-gel derived hydrogen annealed ZnO:Al films for silicon solar cell application.” Sol. Energy. Mater. Sol. Cells, vol. 100, pp. 57-60, 2012.
Z. Lamia, T. Touam, D. Vrel, N. Souded, S. B. Yahia, O. Brinza, A. Fischer, and A. Boudrioua. “AZO thin films by sol-gel process for integrated optics.” Coatings, vol. 3, pp. 126-139, 2013.
P. Muthitamongkol, C. Thanachayanont, B. Samransuksamer, K. Seawsakul, M. Horprathum, P. Eiamchai, S. Limwichean, V. Patthanasettakul, N. Nuntawong, P. Songsiriritthiguland, and P. Chindaudom, “The effects of the argon plasma treatments on transparent conductive aluminum-dope zinc oxide thin films prepared by the pulsed DC magnetron sputtering,” Materials Today: Proceedings, vol. 4, pp. 6248-6253, 2017.
Q. J. Jiang, J. G. Lu, Y. L. Yuan, L. W. Sun, X. Wang, Z. Wen, Z. Z Ye, D. Xiao, H. Z. Ge, and Y. Zhao, “Tailoring the morphology, optical and electrical properties of DC-sputtered ZnO:Al films by post thermal and plasma treatments,” Materials Letters, vol. 106, pp. 125-128, 2013.
Downloads
Published
How to Cite
Issue
Section
License
Copyright (c) 2023 Journal of Metals, Materials and Minerals
This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
Authors who publish in this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this journal.
