Antireflective surface of nanostructures fabricated by CF<sub>4</sub> plasma etching
Keywords:
Antireflection, Dewetting, Plasma etchingAbstract
In this research, the nanostructures surface were fabricated by the CF4 plasma etching process on the SiO2-based substrates for antireflection applications. The nickel films were firstly deposited on the substrates by the sputtering system. The prepared Ni layers were then annealed at 500°C for 1 minute in order to promote dewetting process to be used as metal masks. During the etching process, CF4 etching condition was performed for 15-60 min to create the SiO2 nanopillars. After the etching process, the samples were immersed in nitric acid for 5 min to remove the nickel masks. The SiO2 nanopillars without Ni were investigated for physical morphologies and optical properties by the field-emission scanning electron microscopy (FESEM) and  UV-Vis-NIR spectroscopy respectively. The results showed that the etching conditions greatly affected the sizes and shapes of the nanostructures, as well as improved the antireflection properties of the SiO2 based materials.
Downloads
References
Raut, H. K., Ganesh Nair V.A. and Ramakrishna, A.S.S. (2011). AntiReflective Coatings: A Critical, In Depth Review. Energy Environ. Sci. 4: 3779- 3804.
Chattopadhyay, Huang S., Jen Y.F., Ganguly Y.J., A. Chen, K.H. Chen, L.C. (2010). AntiReflecting and Photonic Nanostructures. Mater. Sci.Eng. R-Rep. 69: 1-35.
Ye, Jiang X., Huang X., Geng J., Sun F., Zu L., Wu X. and Zheng W., W. (2015). Formation of Broadband Antireflective and Super-hydrophilic Subwavelength Structures on Fused Silica Using OneStep Self-Masking Reactive Ion Etching. Sci. Rep. 5: 13023.
Park, G.C., Song, Y.M., Ha, J-H. and Lee, Y.T. (2011). Broadband Antireflective Glasses with Subwavelength Structures Using Randomly Distributed Ag Nanoparticles. J. Nanosci. Nanotechnol. 11: 6152-6156.
Shang, P., Xiong, S.M., Deng, Q.L., Shi, L.F. and Zhang, M. (2014). Disordered Anti reflective Subwavelength Structures Using Ag nanoparticles on Fused Silica Windows. Appl. Opt. 53(29): 6789-6796.
Ye, X., Huang, J., Geng, F., Sun, L., Hongjie, L., Jiang, X., Wu, W., Zu, X. and Zheng, W. (2016). Broadband Antire flection Sub -wavelength Structures on Fused Silica Using Lower Temperatures Normal Atmosphere Thermal Dewetted Au Nanopatterns. IEEE Photon. Technol. Lett. 8(1): 2700110.
Xu, H., Lu, N., Qi, D., Hao, J., Gao, L., Z h a n g , B . a n d C h i , L . ( 2 0 0 8 ) . Biomimetic Antireflective Si Nanopillar Arrays. Small. 4(11): 1972-1975.
Wang, S., Yu, X.Z. and Fan H.T., (2007). Simple Lithographic Approach for Subwavelength Structure Antireflection. Appl. Phys. Lett. 91: 061105.
Lee, Y., Koh, K., Na, H., Kim, K., Kang J-J. and Kim, J. (2009). Lithography-Free Fabrication of Large Area Subwavelength Antireflection Structures Using Thermally Dewetted Pt/Pd Alloy Etch Mask. Nanoscale Res. Lett. 4(4): 364-370.
Tulli, D., Hart, S.D., Mazumder, P., Carrilero, A., Tian, L., Koch, K.W., Yongsunthon, R., Piech, G.A. and Pruneri, V. (2014). Monolithically Integrated Micro- and Nanostructured Glass Surface with Antiglare, Antireflection, and Super-hydrophobic Properties. Appl. Mater. Interfaces. 6(14): 11198-11203.
Lowdermilk, W.H., and Milam, D., (1980). Graded-Index Antireflection Surfaces for High-Power Laser Applications. Appl. Phys. Lett. 36: 891-893.
Hedayati, M.K. and Elbahri, M. (2016). Antireflective Coatings: Conventional Stacking Layers and Ultrathin Plasmonic Metasurfaces, A MiniReview. Materials 9(6): 497.
Leem, J.W., Yeh, Y. and Yu, J.S. (2012). Enhanced transmittance and hydrophilicity of nanostructured glass substrates with antireflective properties using disordered gold nanopatterns. Optics Express. 20(4): 4056
Lalanne, P. and Morris, G.M. (1996). Design, Fabrication and Characterization of Subwavelength Periodic Structures for Semiconductor Antireflection Coating in the Visible Domain. Proc. SPIE. 2776: 300-309.
Walheim, S., Schäffer, E., Mlynek, J. and Steiner, U. (1999). Nanophase-Separated Polymer Films as High-Performance Antireflection Coatings. Science. 283: 520-522.
Wang, S., Yu, X.Z. and Fan, H.T. (2007). Simple Lithographic Approach for Sub-wavelength Structure Antireflection. Appl. Phys. Lett. 91(6): 061105.
Leem, J.W., Yu, J.S., Song, Y.M. and Lee Y.T. (2011). Antireflection Characteristics of Disordered GaAs Subwavelength Structures by Thermally Dewetted Au Nanoparticles. Sol. Energy Mater. Sol. Cells. 95(2): 669-676.
Vitanov, P., Harizanova, A., Ivanova, T. and Dikov, H. (2014). Low-Temperature Depositionof Ultrathin SiO2 Films on Si Substrates. J. Phys. Conf. Ser. 514: 012010.
Hiller, D., Zierold, R., Bachmann, J., Alexe, M., Yang, Y., Gerlach, J.W., Stesmans, A., Jivanescu, M., Müller, U., Vogt, J., Hilmer, H., Löper, P., Künle, M., Munnik, F., Nielsch, K. and Zacharias, M. (2010). Low Temperature Silicon Dioxide by Thermal Atomic Layer Deposition: Investigation of Material Properties. J. Appl. Phys. 107: 064314.
Schaepkens, M., Oehrleina, G.S. and Cook, J.M. (2000). Effect of Radio Frequency Bias Power on SiO2 Feature Etching in Inductively Coupled Fluorocarbon Plasmas. J. Vac. Sci. Technol. B: Microelectron. Nanometer Struct. Process Meas. Phenom. 18: 848-855.
Son, J., Kundu, S., Verma, L.K., Sakhuja, M., Danner, A.J., Bhatia, C.S. and Yang, H. (2011). A Practical Superhydrohilic Self Cleaning and Antireflective Surface for Outdoor Photovoltaic Application. Sol.Energ. Mat. Sol. Cells. 98: 46-51.
Verma L.K., Sakhuja M., Son, J., Danner A.J., Yang H., Zeng H.C and Bhatia C.S. (2012). Self-Cleaning and Antireflective Packaging Glass for Solar Modules. Renew. Energy. 36: 2489-2493.
Thompson, C.V. (2012). Solid-State Dewetting of Thin Films. Annu. Rev. Mater. Res. 42: 399-434. 24. Kim, D., Giermann, A.L. and Thompson, C.V. (2009). Solid-State Dewetting of Patterned Thin Films. Appl. Phys. Lett. 95(25): 251903.
Park, G.C., Song, Y.M., Kang, E.K. and Lee, Y.T. (2012). Size-Dependent Optical Behavior of Disordered Nanostructures on Glass Substrates. Appl. Opt. 51(24): 5890- 5896.
Song, Y.M., Park, G.C., Kang, E.K., Yeo, C.L. and Lee, Y.T. (2013). Antireflective Grassy Surface on Glass Substrates with SelfMasked Dry Etching. Nanoscale Res. Lett. 8: 505
Cho, S.J., An, T., Kim, J.Y., Sung, J. and Lim, G. (2011). Super hydrophobic Nano-structured Silicon Surfaces with Controllable Broadband Reflectance. Chem. Commun. 47(21): 6108-6110.
Sakuma, S., Sugita, M. and Arai, F. (2013). Fabrication of Nanopillar Micropatterns by Hybrid Mask Lithography for SurfaceDirected Liquid Flow. Micromachines. 4(2): 232-242
Downloads
Published
How to Cite
Issue
Section
License
Copyright (c) 2017 Journal of Metals, Materials and Minerals
This work is licensed under a Creative Commons Attribution-NonCommercial-NoDerivatives 4.0 International License.
Authors who publish in this journal agree to the following terms:
- Authors retain copyright and grant the journal right of first publication with the work simultaneously licensed under a Creative Commons Attribution License that allows others to share the work with an acknowledgment of the work's authorship and initial publication in this journal.
- Authors are able to enter into separate, additional contractual arrangements for the non-exclusive distribution of the journal's published version of the work (e.g., post it to an institutional repository or publish it in a book), with an acknowledgment of its initial publication in this journal.