Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation

Authors

  • Chantana AIEMPANAKIT Division of Physics, Faculty of Science and Technology, Rajamangala University of Technology Thanyaburi, Pathumtani 12110, Thailand
  • Areeya CHANACHAI Department of Physics, Faculty of Science and Technology, Thammasat University, Prathumthani, 12121, Thailand
  • Nattaya KANCHAI Department of Physics, Faculty of Science and Technology, Thammasat University, Prathumthani, 12121, Thailand
  • Montri AIEMPANAKI Department of Physics, Faculty of Science, Silpakorn University, Nakhon Pathom, 73000, Thailand
  • Kamon AIEMPANAKIT Department of Physics, Faculty of Science and Technology, Thammasat University, Prathumthani, 12121, Thailand

DOI:

https://doi.org/10.55713/jmmm.v31i2.1084

Keywords:

Magnetron sputtering, WO3 film, OAD, Electrochromic, Thermal oxidation

Abstract

In this work, WO3 thin films were prepared in two steps: First, tungsten (W) films with thickness of 100-300 nm were deposited by DC magnetron sputtering with oblique angle deposition (OAD) technique at 0 and 85. Second, sputtered W films were annealed under air atmosphere at a temperature of 500℃ and different oxidation times for 1-3 h. The structure of WO3 thin films were examined by X-ray diffraction and field emission scanning electron microscope. In addition, the optical and electrochromic properties of the WO3 thin films were measured by a spectrophotometer before and after testing in potassium hydroxide electrolytes. The results showed that the OAD technique can enhance porosity and exert high oxidation in W films. The increase in film thickness and oxidation time indicated that the crystallinity of WO3 films increased. The condition of WO3 films for OAD at 85, thickness of 300 nm, and oxidation time of 1 h showed the best electrochromic property with the highest optical modulation and current density.

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Published

2021-06-27

How to Cite

[1]
C. AIEMPANAKIT, A. CHANACHAI, N. KANCHAI, M. AIEMPANAKI, and K. AIEMPANAKIT, “Electrochromic property of tungsten trioxide films prepared by DC magnetron sputtering with oblique angle deposition and thermal oxidation”, J Met Mater Miner, vol. 31, no. 2, pp. 123–128, Jun. 2021.

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